Plasma stripper etcher
H2O vapor as a processing gas for crust, resist, and residue removal for post ion implant resist strip. Method for removing etching residues and contaminants.
Plasma Cleaning and Etching Equipment by Plasma Etch Inc.
Semiconductor Plasma Asher Descum Stripper Etcher Equipment
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Pritzker Nanofab at UChicago
Plasma etch
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Oven Technology Notifies supervisor of equipment malfunction or substandard etching quality.
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Oxford Instruments Plasmalab PRS900
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